The American Chamber of Commerce in Taipei is pleased to co-host with the Taiwan-USA Industrial Cooperation Promotion Office (TUSA) of the Ministry of Economic Affairs and The American Institute in Taiwan (AIT) a “Technology Licensing Expert Dialogue” on March 30, 2017. Members of the media are invited to cover the opening session of the dialogue.
Members of the media who plan to cover this event are required to sign up with AIT’s Public Diplomacy Section by noon on March 29 via email to AITinfo@mail.ait.org.tw or fax 2162-2242.
Event: Technology Licensing Expert Dialogue
Time: 9:00 – 10:00 a.m., Thursday, March 30, 2017
Venue: AIT’s American Center – 21st Floor, 333 Keelung Road, Section 1, Taipei
Language: English with simultaneous interpretation
08:40 – Media registration
09:00 – Welcome remarks by Christian Marchant, Acting Deputy Director, AIT
- Remarks by Mei-hua Wang, Vice Minister, Ministry of Economic Affairs
- Remarks by Mark Cohen, Senior Counsel, United States Patent and Trademark Office (USPTO)
09:20 – Group Photos
09:25 – Keynote Speeches
- TIPO, Your Best Partner!, Shu-min Hong, Director General, TIPO (Taiwan Intellectual Property Office)
- Maximizing IP Commercialization: Less is More, Honorable Judge Sidney H. Stein, United States District Court Southern District of New York
10:00 – Opening Session Concludes
The expert dialogue will address the legal framework and provide practical guidance for industry participants in the thriving US$5 billion U.S.-Taiwan licensing trade. This trade creates value through spurring innovation, disseminating technology, and generating income for intellectual property owners through technology transfer and commercialization. This program is being held in furtherance of the October 2016 Digital Economy Forum, at which both sides affirmed the importance of intellectual property rights and licensing to expand two-way technology trade and investment between the two economies.
For more information, please contact the AmCham Government & Public Affairs or tel: 02-2718-8226 ext. 213